Modelling of Microfabrication Systems - Raja Nassar, Weizhong Dai

Modelling of Microfabrication Systems

Buch | Hardcover
X, 270 Seiten
2003 | 2003
Springer Berlin (Verlag)
978-3-540-00252-9 (ISBN)
171,19 inkl. MwSt

This book addresses modeling of systems that are important to the fabrication of three-dimensional microstructures. Selected topics are ion beam micromachining, x-ray lithography, laser chemical vapor deposition, photopolymerization, laser ablation, and thin films. Models simulating the behavior of these systems are presented, graphically illusratted, and discussed in the light of experimental results. Knowledge gained from such models is essential for system operation and optimization. This book is unique in that it focuses on high aspect ratio microtechnology. It will be invaluable to scientists, engineers, graduate students, and manufacturers engaged in research and development for enhancing the accuracy and precision of microfabrication systems for commercial applications.

1 Ion Beam.- 2 X-ray Lithography.- 3 Laser Chemical Vapor Deposition.- 4 Laser Photopolymerization.- 5 Laser Ablation.- 6 Thin Films.- References.

From the reviews:

"This book is aimed at people working on simulation and optimization process fabrication of Microelectromechanical Systems (MEMS). ... the book provides a fairly complete view of the modeling of microfabrication processes. ... 'It will be invaluable to scientists, engineers, graduate students, and manufacturers engaged in research and development for enhancing the accuracy and precision of microfabrication systems for commercial applications'." (Grégory Guisbiers, Physicalia, Vol. 26 (1), 2004)

Erscheint lt. Verlag 13.6.2003
Reihe/Serie Microtechnology and MEMS
Zusatzinfo X, 270 p.
Verlagsort Berlin
Sprache englisch
Maße 155 x 235 mm
Gewicht 530 g
Themenwelt Technik Elektrotechnik / Energietechnik
Schlagworte Chemical vapor deposition • Development • High Aspect Ratio • Ion beam • Laser • Laser Ablation • Machining • MEMS • microelectromechanical system (MEMS) • Micromachining • microsystems • Microtechnology • Mikrotechnik • Modeling • Nanotechnologie • Optimization • Photopolymerization • Thin Films • X-ray lithography
ISBN-10 3-540-00252-9 / 3540002529
ISBN-13 978-3-540-00252-9 / 9783540002529
Zustand Neuware
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