Introduction to Microfabrication - Sami Franssila

Introduction to Microfabrication

(Autor)

Buch | Hardcover
422 Seiten
2004
John Wiley & Sons Ltd (Verlag)
978-0-470-85105-0 (ISBN)
44,94 inkl. MwSt
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Nanotechnology and microengineering are among the top priority research areas for the US and Europe. This text provides coverage of all aspects of the attempt to build functional devices at a molecular size.
Microfabrication is the key technology behind integrated circuits, microsensors, photonic crystals, ink jet printers, solar cells and flat panel displays. Microsystems can be complex, but the basic microstructures and processes of microfabrication are fairly simple. Introduction to Microfabrication shows how the common microfabrication concepts can be applied over and over again to create devices with a wide variety of structures and functions. Featuring: A comprehensive presentation of basic fabrication processes An emphasis on materials and microstructures, rather than device physics In-depth discussion on process integration showing how processes, materials and devices interact A wealth of examples of both conceptual and real devices Introduction to Microfabrication includes 250 homework problems for students to familiarise themselves with micro-scale materials, dimensions, measurements, costs and scaling trends. Both research and manufacturing topics are covered, with an emphasis on silicon, which is the workhorse of microfabrication.
This book will serve as an excellent first text for electrical engineers, chemists, physicists and materials scientists who wish to learn about microstructures and microfabrication techniques, whether in MEMS, microelectronics or emerging applications.

Preface.Acknowledgements.PART I: INTRODUCTION.1. Introduction.2. Micrometrology and Materials Characterization.3. Simulation of Microfabrication Processes.PART II: MATERIALS .4. Silicon.5. Thin-Film Materials and Processes.6. Epitaxy.7. Thin-film Growth and Structure.PART III: BASIC PROCESSES.8. Pattern Generation.9. Optical Lithography.10. Lithographic Patterns.11. Etching.12. Wafer Cleaning and Surface Preparation.13. Thermal Oxidation.14. Diffusion.15. Ion Implantation.16. CMP: Chemical-Mechanical Polishing.17. Bonding and Layer Transfer.18. Molding and Stamping.PART IV: STRUCTURES.19. Self-aligned Structures.20. Plasma-etched Structures.21. Wet-etched Structures.22. Sacrificial Structures.23. Structures by Deposition.PART V: INTEGRATION.24. Process Integration.25. CMOS Transistor Fabrication.26. Bipolar Technology.27. Multilevel Metallization.28. MEMS Process Integration.29. Processing on Non-silicon Substrates.PART VI: TOOLS.30. Process for Microfabrication.31. Tools for Hot Process.32. Vacuum and Plasmas.33. Tools for CVD and Epitaxy.34. Integrated Processing.PART VII: MANUFACTURING.35. Cleanrooms.36. Yield.37. Wafer Fab.PART VIII: FUTURE.38. Moore's Law.39. Microfabrication at Large.Appendix A: Comments and Hints to Selected Problems.Appendix B: Constants and Conversion Factors.Index.

Erscheint lt. Verlag 20.4.2004
Zusatzinfo Illustrations
Verlagsort Chichester
Sprache englisch
Maße 200 x 252 mm
Gewicht 1072 g
Einbandart gebunden
Themenwelt Technik Elektrotechnik / Energietechnik
ISBN-10 0-470-85105-8 / 0470851058
ISBN-13 978-0-470-85105-0 / 9780470851050
Zustand Neuware
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